BEGIN:VCALENDAR
VERSION:2.0
PRODID:-//wp-events-plugin.com//7.2.3.1//EN
TZID:America/New_York
X-WR-TIMEZONE:America/New_York
BEGIN:VEVENT
UID:117@c2mi.ca
DTSTART;TZID=America/New_York:20190416T083000
DTEND;TZID=America/New_York:20190416T170000
DTSTAMP:20190219T185029Z
URL:https://www.c2mi.ca/en/evenements/plasma-etching-for-semiconductors-1-
 day-training/
SUMMARY:Plasma Etching for Semiconductors 1-DAY Training
DESCRIPTION:For beginners and intermediates as scientist\, engineer\, or te
 chnologist in microelectronics field. After this 1-day training\, students
  will understand how a plasma is generated\, how it behaves in the plasma 
 reactor (RIE\, DRIE)\, and how it etches material. They will receive key k
 nowledges which they can later apply on their systems to develop a plasma 
 etching recipe by their own. Covered subjects:\n\n1. Plasma Fundamentals\n
 2. Plasma Systems\n3. Anisotropic Etching\n4. Silicon and Compounds\n5. De
 ep Reactive Ion Etching (DRIE)\n6. Other material Etching\n7. Profile char
 acterisation\n8. End Point Detection\n\nNote: Depending on attendees\, the
  course will be given in english\, or in french or both for the convenienc
 e of the audience.\n\nRegistration here
ATTACH;FMTTYPE=image/jpeg:https://www.c2mi.ca/wp-content/uploads/2019/02/P
 lasma-Semi_16-avril-2019-e1550601463553.jpg
LOCATION:MiQro Innovation Collaborative Centre\, 45 Boulevard de l'Aéropor
 t\, Bromont\, QC\, J2L 1A3\, Canada
GEO:45.2989796;-72.72553619999996
X-APPLE-STRUCTURED-LOCATION;VALUE=URI;X-ADDRESS=45 Boulevard de l'Aéroport
 \, Bromont\, QC\, J2L 1A3\, Canada;X-APPLE-RADIUS=100;X-TITLE=MiQro Innova
 tion Collaborative Centre:geo:45.2989796,-72.72553619999996
END:VEVENT
BEGIN:VTIMEZONE
TZID:America/New_York
X-LIC-LOCATION:America/New_York
BEGIN:DAYLIGHT
DTSTART:20190310T030000
TZOFFSETFROM:-0500
TZOFFSETTO:-0400
TZNAME:EDT
END:DAYLIGHT
END:VTIMEZONE
END:VCALENDAR