Integrated microsystems laboratory (MEMS) / Photoresist Stripping and Ashing / Resist strip
Ulvac Enviro 1Xa
CAPABILITY:
Choice of plasma sources
Forming gas 3.5% provides the advantage of catalysis for generation of atomic oxygen in plasma
Possibility of additional gas for removal of Bosch process polymers
Excellent uniformity and repeatability
High throughput
End-point detection
Very fast ashing of a variety of polymers:
