CAPABILITY: Isopod – In situ resist removal In situ strip for corrosion prevention Isotropic polymide removal (dry release)
CAPABILITY: Dry-in/dry-out automated SMIF pod input/output operation; Mini-environment within wet bench secures class 1 clean room performance on the wafer
CAPABILITY: Choice of plasma sources Forming gas 3.5% provides the advantage of catalysis for generation of atomic oxygen in plasma