SVS Jikji-77

SVS Jikji-77

Integrated microsystems laboratory (MEMS) / Plating / Electrodeposition of metal and dielectric

SVS Jikji-77

Supplier :

Model :

Purpose :

Through Silicon Via filling of copper and Au-Sn

CAPABILITY:

Wafer size: 200 mm

Thickness range of wafers: 300 – 1200 µm

Wafer material: Silicon, Glass

Fully qualified for through silicon via AquiViaTM process under license from Alchimer, with the following modules:

  • Module 1: Pre-wetting of Si wafers with 20:1 aspect ratio vias
  • Module 2: Chemical grafting of 0.2-1.0 µm insulation film
  • Module 3: Activation of insulation for Ni(B)
  • Module 4: Electroless Ni(B) diffusion barrier
  • Module 5: Cu electrofill in 50:5µm & 100:5µm TSV
  • Module 6: Wafer annealing
  • Module 7: 80Au/20Sn eutectic electroplating

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