In fact, cleaning methods which require no water nor solvents are well indicated for the sensitive microelectronic devices. Plasma cleaning is one of those techniques. It consists of placing the device to clean inside a special chamber, into which vacuum is made. The chamber is then filled with an ionized gas. Depending on the gas chosen, the cleaning action will differ. For example, oxygen will get rid of the organic contaminants by a chemical action, while argon will dislodge the contaminants on the surface by a mechanical action. It is also possible to use the method for more than just cleaning. A plasma treatment can be useful to change the surface’s energy to promote glue adhesion.