Integrated microsystems laboratory (MEMS) / Metrology / Pattern recognition and thin film metrology
N&K technology Inc.
Supplier :
Model :
Purpose :
Pattern Recognition Thin Film Metrology Tool
CAPACITY
Spectroscopic reflectometry
UV-VIS-NIR-IR
Film thickness from 190 nm to 15.0 µm
Film properties (t, n, k):
- Organic films (UV)
- Metals (UV)
- Dielectric films (UV-VIS)
- SOI quality control (NIR)
- Si membranes (NIR)
- Thick polymers (FIR)
Stoichiometry maps
Possibility of depth, CD, and Profile mapping for trenches and TSV (with AR up to 20:1)
