Analytical laboratory / Etch Facilities / Plasma asher
Plasmaline 415 (Barrel etcher)/ March CS-1701 etcher (RIE)
Supplier :
Model :
Purpose :
Dry etch tools for surface cleaning or delayering
CAPABILITY:
13,56 MHz plasma chambers
Barrel etcher for anisotropic etch and RIE tool for isotropic etch
Various gas available for etching of different material:
O2, SF6, CHF3, CF4, Ar
max samples size: up to 5”
Plasma Power:
Plasmaline 415: 300W
March: CS-1701: 600W
Temperature control available on the RIE tool (chiller)
