Analytical laboratory / Etch Facilities / Plasma asher
March CS-1701 (RIE)
Supplier :
March
Model :
RIE CS-1701
Purpose :
Surface etch with plasma
CAPABILITY:
Surface etch or conditioning with the use of a plasma
Power: up to 600W
Available gas: N2, Ar, O2, CF4
Maximum sample diameter: 15 cm
