Integrated microsystems laboratory (MEMS) / Lithography / 5X Stepper aligner ASML PAS5500 / 200B Supplier : ASML Model : PAS5500 / 200B Purpose : Aligner and multi-step imaging CAPABILITY: 5X Stepper Aligner Resolution down to 350 nm Front-to-front alignment: 50 nm, 3 sigma Back-to-back alignment: 80 nm, 3 sigma Front-to-back alignment: 210 nm, 3 sigma Directly interfaced with TEL coating-developing track Dry film exposures