ASML PAS5500 / 200B

ASML PAS5500 / 200B

Integrated microsystems laboratory (MEMS) / Lithography / 5X Stepper aligner

ASML PAS5500 / 200B

Supplier :

Model :

Purpose :

Aligner and multi-step imaging

CAPABILITY:

5X Stepper Aligner

Resolution down to 350 nm

Front-to-front alignment: 50 nm, 3 sigma

Back-to-back alignment: 80 nm, 3 sigma

Front-to-back alignment: 210 nm, 3 sigma

Directly interfaced with TEL coating-developing track

Dry film exposures

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