Quantum Device Fabrication

Quantum Device Fabrication

C2MI’s quantum fabrication sector provides a specialized environment for developing emerging technologies based on the quantum properties of matter. Using advanced microfabrication equipment, our teams develops superconductive films, photonic platforms, and other complex quantum devices on 200 mm wafers. 

This sector enables the creation of processes tailored to the demands of quantum computing, ultra-sensitive sensors, and next-generation communication systems. By combining precision, repeatability, and technical expertise, C2MI helps its partners bridge the gap between research and scalable industrial applications. 

Metrology

Inspection Infrared: multilayer and overlay measurement
Pattern recognition and thin film metrology
Inspection visible range: particle and defect count

Photoresist Stripping and Ashing

Lift-off

Dry lift-off and detaping

Thin film deposition

Low pressure chemical vapour deposition / LSN
Plasma enhanced chemical vapour deposition
Diffusion / Oxidation
Low pressure chemical vapour deposition / TEOS
Low pressure chemical vapour deposition / ISDP

Chemical / Mechanical Polishing

Polishing and planarisation

Wafer handling

Transfer system

Bonder

Wafer bonding

Plating

Electrodeposition of metal and dielectric

Thermal treatment

Anneal
Sub-atmospheric pressure / Bake anneal
High vacuum bake

Wet etching

Wafer cleaning
Silicon etch
Oxide, nitride, aluminium etch

Dry etching

Release Etch
Metal etch
02 plasma polymers strip
Dielectric etch
Silicon etch
02 plasma polymers strip

RESEARCH

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